A PROCESSING ROUTINE FOR LAYERED Si<sub>3</sub>N<sub>4</sub>/SiCN STRUCTURES WITH GRADED MULTISCALAR POROSITY

A PROCESSING ROUTINE FOR LAYERED Si₃N₄/SiCN STRUCTURES WITH GRADED MULTISCALAR POROSITY

Christina Drechsel^a, Roland Haubner^a, Thomas Konegger^a

^a E164 - Institute of Chemical Technologies and Analytics